Method for calculating the metrics of an IC manufacturing process
US10423074B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 2, 2015 |
| Grant date | Sep 24, 2019 |
| Priority date | — |
| Expiry date | Jun 2, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for calculating the parameters of a resist model of an IC manufacturing process is provided. Accordingly, a function representative of the target design convoluted throughout the whole target design with a kernel function compounded with a deformation function with a shift angle. The deformation function is replaced by its Fourier series development, the order of which is selected so that the product of convolution is invariant through rotations within a tolerance of the corrections to be applied to the target design. Alternatively, the product of convolution may be decomposed into basic kernel functions selected varying by angles determined so that a deformation function for a value of the shift angle can be projected onto a couple of basic kernel functions the angles of which are proximate to the shift angle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.