Pressure measuring device and exhaust system using the same, and substrate processing apparatus
US10429263B2 · kind B2 · utility
0Cited by
3References
9Claims
0Family size
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Key dates
| Filing date | Mar 15, 2017 |
| Grant date | Oct 1, 2019 |
| Priority date | — |
| Expiry date | Aug 12, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01L19/0015
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
There is provided a pressure measuring device including: a first pressure gauge connected to a processing chamber configured to process a process target and configured to measure an internal pressure of the processing chamber when the process target is being processed; a second pressure gauge connected to the processing chamber; and a first switching valve configured to disconnect the second pressure gauge from the processing chamber when the process target is being processed inside the processing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.