Methods and apparatuses for increasing reactor processing batch size
US10431451B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 31, 2017 |
| Grant date | Oct 1, 2019 |
| Priority date | — |
| Expiry date | Dec 5, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02164
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Certain embodiments herein relate to methods of increasing a reaction chamber batch size. A portion of a batch of wafers is processed within the chamber. The processing results in at least some off-target deposition of material on interior surfaces of the reaction chamber. A mid-batch chamber processing is conducted to stabilize the off-target deposition materials accumulated on the chamber interior surfaces. Another portion of the batch of wafers is processed within the chamber. In various embodiments, processing of the chamber (e.g., mid-batch) and subsequent portion of the batch of wafers is repeated until processing of all wafers is complete. Batch size refers to the number of wafers that may be processed in the reaction chamber between chamber clean cycles. Chamber interior surfaces are seasoned prior to batch processing. Seasoning of the chamber interior surfaces involves applying a coating of the same material that may be used for deposition on the wafers during processing of the same.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.