Fluid monitoring system and method for semiconductor fabrication tools
US10438826B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 9, 2018 |
| Grant date | Oct 8, 2019 |
| Priority date | — |
| Expiry date | Aug 9, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01M1/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and method provide for monitoring and controlling fluid flow in semiconductor manufacturing apparatuses. The method and system include a vortex flow meter coupled to a digital readout that displays the measured flow rate and trip point. The flow meter display includes input devices used to adjust the trip point. The system and method provide for sending signals via a custom relay to the semiconductor manufacturing apparatus which is adapted to terminate a processing operation or change the fluid flow if the trip point is tripped. The system and method also provide for sending an electrical signal to a computer by way of a data acquisition unit and a converter. The converter converts the signal to a communication protocol consistent with the computer network and provides fluid flow information and trip point data as a function of time to the computer which then displays such data graphically.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.