Cleaning apparatus and cleaning method
US10441979B2 · kind B2 · utility
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1References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 10, 2015 |
| Grant date | Oct 15, 2019 |
| Priority date | — |
| Expiry date | Jun 25, 2036 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA46B2200/30
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
According to one embodiment, there is provided a cleaning apparatus including a substrate cleaner and a member cleaner. The substrate cleaner has a substrate cleaning member placed over a first region to be opposite a substrate and a second region different from the first region. The member cleaner is placed adjacent to the second region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.