Patent · US Active

Particle source for producing a particle beam and particle-optical apparatus

US10446360B2 · kind B2 · utility

0Cited by

4References

20Claims

0Family size

Assignee

Carl Zeiss Microscopy GmbH · DE

Inventors

Volker Drexel · Oberkochen, DE
Bernd Hafner · Aalen, DE

Key dates

Filing date	May 10, 2018
Grant date	Oct 15, 2019
Priority date	—
Expiry date	May 10, 2038

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/152
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A particle source for producing a particle beam includes a particle emitter, a first plate, a first deflector and a second plate with an aperture. The first plate has a smaller aperture, downstream of which a first beam is formed, and a larger aperture, downstream of which a second beam is formed. A controller sets the deflection angle of the deflector so that in a first mode of operation that particles of the first beam pass through the aperture in the second plate and form the particle beam produced by the particle source. The controller sets the deflection angle so that in a second mode of operation that particles of the second beam pass through the aperture in the second plate and form the particle beam produced by the particle source.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.