Endpoint detection algorithm for atomic layer etching (ALE)
US10453653B2 · kind B2 · utility
3Cited by
37References
13Claims
0Family size
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Key dates
| Filing date | Mar 8, 2017 |
| Grant date | Oct 22, 2019 |
| Priority date | — |
| Expiry date | Mar 8, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/26
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Described herein are architectures, platforms and methods for determining endpoints of an optical emission spectroscopy (OES) data acquired from a plasma processing system. The OES data, for example, includes an absorption—step process, a desorption—step process, or a combination thereof. In this example, the OES data undergoes signal synchronization and transient signal filtering prior to endpoint determination, which may be implemented through an application of a moving average filter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.