Spatially resolved optical emission spectroscopy (OES) in plasma processing
US10473525B2 · kind B2 · utility
3Cited by
16References
20Claims
0Family size
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Key dates
| Filing date | Jul 12, 2017 |
| Grant date | Nov 12, 2019 |
| Priority date | — |
| Expiry date | Nov 3, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/10
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed is a method, system, and apparatus for optical emission measurement. The apparatus includes a collection system for collecting a plasma optical emission spectra through an optical window disposed at a wall of a plasma processing chamber. The optical system includes a mirror configured to scan a plurality of non-coincident rays across the plasma processing chamber; and a telecentric coupler for collecting an optical signal from a plasma and directing the optical signal to a spectrometer for measuring the plasma optical emission spectra.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.