Substrate processing apparatus
US10475641B2 · kind B2 · utility
3Cited by
2References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 8, 2017 |
| Grant date | Nov 12, 2019 |
| Priority date | — |
| Expiry date | Sep 8, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6719
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing apparatus includes an inner tube installed to accommodate a plurality of substrates and having a first opening, an outer tube configured to surround the inner tube, a movable wall installed inside the inner tube or between the inner tube and the outer tube, configured to be movable, and having a second opening, a gas supply part configured to supply a process gas to the substrates and an exhaust part installed outside the movable wall and configured to exhaust the process gas supplied to the substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.