Topcoat compositions containing fluorinated thermal acid generators
US10481495B2 · kind B2 · utility
0Cited by
6References
19Claims
0Family size
Assignee
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Key dates
| Filing date | Feb 7, 2019 |
| Grant date | Nov 19, 2019 |
| Priority date | — |
| Expiry date | Feb 7, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/16
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided are topcoat compositions that include: a matrix polymer; a surface active polymer; an ionic thermal acid generator comprising an anion and a cation, wherein the anion, the cation, or the anion and the cation are fluorinated; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions. The invention has particular applicability in photolithographic processes as a photoresist topcoat layer in the manufacture of semiconductor devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.