Doris Kang
12Patents
1h-index
19Co-inventors
47Inventor score
Filing activity: Jun 8, 2010 → Jun 24, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10241411B2 | Topcoat compositions containing fluorinated thermal acid generators | Electricity | 2 | Active |
| US10578969B2 | Photoresist topcoat compositions and methods of processing photoresist compositions | Electricity | 1 | Active |
| US9436082B2 | Compositions comprising base-reactive component and processes for photolithography | Physics | 1 | Active |
| US12234369B2 | Photoresist topcoat compositions and methods of processing photoresist compositions | Physics | 0 | Active |
| US10197918B2 | Photoresist topcoat compositions and methods of processing photoresist compositions | Electricity | 0 | Active |
| US10481495B2 | Topcoat compositions containing fluorinated thermal acid generators | Physics | 0 | Active |
| US10042259B2 | Topcoat compositions and pattern-forming methods | Chemistry; Metallurgy | 0 | Active |
| US11106137B2 | Compositions comprising base-reactive component and processes for photolithography | Physics | 0 | Active |
| US11846885B2 | Topcoat compositions and photolithographic methods | Electricity | 0 | Active |
| US10180627B2 | Processes for photolithography | Electricity | 0 | Active |
| US9696627B2 | Compositions comprising base-reactive component and processes for photolithography | Physics | 0 | Active |
| US11940731B2 | Photoresist topcoat compositions and methods of processing photoresist compositions | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.