Patent · US Active

Methods of operating a deposition apparatus, and deposition apparatus

US10483465B2 · kind B2 · utility

0Cited by

1References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Jose Manuel DIEGUEZ-CAMPO · Hanau, DE
Stefan Bangert · Lauentheil, DE
Andreas Lopp · Neuses, DE
Harald WURSTER · Mömbris, DE
Dieter Haas · Bruchköbel, DE

Key dates

Filing date	May 10, 2016
Grant date	Nov 19, 2019
Priority date	—
Expiry date	May 10, 2036

Classification

Technology area (CPC H)Electricity
CPC primaryH10K71/40
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A method of operating a deposition apparatus is provided. The method comprises: Deposition of an evaporated source material on a substrate by guiding the evaporated source material from one or more outlets of an evaporation source toward the substrate, wherein part of the evaporated source material is blocked by and attaches to a shielding device arranged between the one or more outlets and the substrate, followed by a cleaning of the shielding device by at least locally heating the shielding device for releasing at least part of the attached source material from the shielding device. According to a further aspect, a deposition apparatus is provided that can be operated according to the described methods.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.