Device to increase deposition uniformity in spatial ALD processing chamber
US10494736B2 · kind B2 · utility
0Cited by
1References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 29, 2017 |
| Grant date | Dec 3, 2019 |
| Priority date | — |
| Expiry date | Jun 29, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4584
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Susceptor assemblies comprising a susceptor with a top surface with a plurality of recesses and a bottom surface are described. A heater is positioned below the susceptor to heat the susceptor. A shield is positioned between the bottom surface of the susceptor and the heater. The shield increases deposition uniformity across the susceptor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.