Alexander S. Polyak
19Patents
5h-index
23Co-inventors
66Inventor score
Filing activity: Jul 23, 1991 → Sep 3, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6080270A | Compact microwave downstream plasma system | Electricity | 27 | Expired |
| US5139383A | Device for positioning objects within a sealed chamber | Emerging Cross-Sectional Technologies | 23 | Expired |
| US7288165B2 | Pad conditioning head for CMP process | Electricity | 9 | Expired |
| US6939210B2 | Slurry delivery arm | Performing Operations; Transporting | 8 | Expired |
| US7377002B2 | Scrubber box | Performing Operations; Transporting | 7 | Expired |
| US5243867A | Mechanism for feedthrough of rotary motion to a sealed chamber | Emerging Cross-Sectional Technologies | 5 | Expired |
| US5207510A | Linear ball bearing assembly | Mechanical Engineering; Lighting; Heating | 4 | Expired |
| US10954596B2 | Temporal atomic layer deposition process chamber | Electricity | 3 | Active |
| US11501957B2 | Pedestal support design for precise chamber matching and process control | Electricity | 1 | Active |
| US7774887B2 | Scrubber box and methods for using the same | Performing Operations; Transporting | 1 | Active |
| US8899408B2 | Temperature actuated tensioning mechanism | Electricity | 1 | Active |
| US7459056B2 | Pad conditioning head for CMP process | Electricity | 1 | Active |
| US9022715B2 | Load lock chamber designs for high-throughput processing system | Electricity | 1 | Active |
| US11085129B2 | Device to increase deposition uniformity in spatial ALD processing chamber | Chemistry; Metallurgy | 0 | Active |
| US10658223B2 | Apparatus for prevention of backside deposition in a spatial ALD process chamber | Electricity | 0 | Active |
| US10415137B2 | Non-metallic thermal CVD/ALD Gas Injector and Purge Systems | Electricity | 0 | Active |
| US10959294B2 | High temperature heater for processing chamber | Electricity | 0 | Active |
| US11798825B2 | In-situ wafer rotation for carousel processing chambers | Electricity | 0 | Active |
| US10494736B2 | Device to increase deposition uniformity in spatial ALD processing chamber | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.