Laser system or laser exposure system
US10495890B2 · kind B2 · utility
0Cited by
2References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 5, 2016 |
| Grant date | Dec 3, 2019 |
| Priority date | — |
| Expiry date | May 25, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2383
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A laser exposure system may include a plurality of laser devices configured to output laser beams with which an irradiated subject is irradiated, and at least one beam property adjustment unit disposed on optical paths of the laser beams outputted from the plurality of laser devices, and configured to allow beam properties of the laser beams to be approximately a same as each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.