Patent · US Active

Generation of a map of a substrate using iterative calculations of non-measured attribute data

US10503850B2 · kind B2 · utility

0Cited by
6References
17Claims
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Key dates

Filing dateApr 11, 2017
Grant dateDec 10, 2019
Priority date—
Expiry dateNov 27, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67253
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Described herein are technologies to facilitate the generation and presentation of a map of an attribute of a substrate, such as a semiconductor wafer. Using the data of measured attribute (e.g., thickness, temperature, etc.) of a substrate, one or more of the described implementations generate data of non-measured (i.e., calculated) attributes to complete a map of the substrate using model parameters and a correlations model, such as a squared exponential Gaussian process model.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.