Lithographic apparatus and device manufacturing method
US10514618B2 · kind B2 · utility
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35References
20Claims
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Key dates
| Filing date | Jul 3, 2018 |
| Grant date | Dec 24, 2019 |
| Priority date | — |
| Expiry date | Jul 3, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.