Marcus Adrianus Van De Kerkhof
102Patents
8h-index
222Co-inventors
83Inventor score
Filing activity: Feb 12, 2002 → Apr 23, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7213963B2 | Lithographic apparatus and device manufacturing method | Physics | 160 | Expired |
| US6650399B2 | Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations | Physics | 103 | Expired |
| US8724087B2 | Inspection apparatus for lithography | Physics | 86 | Active |
| US8482845B2 | Lithographic apparatus and device manufacturing method | Physics | 30 | Active |
| US8786825B2 | Apparatus and method of measuring a property of a substrate | Physics | 24 | Active |
| US7375799B2 | Lithographic apparatus | Physics | 12 | Expired |
| US8891061B2 | Lithographic focus and dose measurement using a 2-D target | Physics | 10 | Active |
| US7907255B2 | Lithographic apparatus and device manufacturing method | Physics | 10 | Expired |
| US8830472B2 | Method of assessing a model of a substrate, an inspection apparatus and a lithographic apparatus | Physics | 8 | Active |
| US7315353B2 | Apodization measurement for lithographic apparatus | Physics | 6 | Expired |
| US8982347B2 | Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatus | Physics | 5 | Active |
| US8482718B2 | Lithographic apparatus and device manufacturing method | Physics | 5 | Active |
| US9182678B2 | Lithographic apparatus and device manufacturing method | Physics | 5 | Active |
| US8233134B2 | Lithographic apparatus and device manufacturing method | Physics | 5 | Active |
| US8035798B2 | Lithographic apparatus and device manufacturing method | Physics | 4 | Active |
| US8947637B2 | Lithographic apparatus and device manufacturing method | Physics | 4 | Active |
| US8823919B2 | Lithographic apparatus, removable member and device manufacturing method | Emerging Cross-Sectional Technologies | 4 | Active |
| US10935673B2 | Radiation analysis system | Physics | 4 | Active |
| US9316919B2 | Lithographic apparatus and device manufacturing method | Physics | 4 | Active |
| US9436099B2 | Lithographic focus and dose measurement using a 2-D target | Physics | 4 | Active |
| US7889315B2 | Lithographic apparatus, lens interferometer and device manufacturing method | Physics | 3 | Active |
| US8659741B2 | Lithographic apparatus, removable member and device manufacturing method | Emerging Cross-Sectional Technologies | 3 | Active |
| US8462314B2 | Lithographic apparatus and device manufacturing method | Physics | 3 | Active |
| US9746785B2 | Sub-wavelength segmentation in measurement targets on substrates | Electricity | 3 | Active |
| US9255892B2 | Substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatus | Emerging Cross-Sectional Technologies | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.