Apparatus and method for providing a uniform flow of gas
US10519546B2 · kind B2 · utility
5Cited by
9References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 9, 2018 |
| Grant date | Dec 31, 2019 |
| Priority date | — |
| Expiry date | Nov 9, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/509
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Outer distribution rings and gas distribution apparatus with outer distribution rings to deliver a gas flow to a process region of a process chamber are described. The outer distribution rings include at least one plenum in fluid communication with a plurality of openings forming a plurality of trenches to allow gas to flow from the plenum through the openings and down an inner peripheral face of the outer distribution ring.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.