Inventor · San Jose, CA, US

Muhammad M. Rasheed

81Patents
7h-index
114Co-inventors
75Inventor score

Filing activity: Jan 7, 2002 → Jul 20, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US8558299B2 Semiconductor device with gate electrode stack including low resistivity tungsten and method of forming Electricity 22 Active
US6764265B2 Erosion resistant slit valve Emerging Cross-Sectional Technologies 17 Expired
US8895450B2 Low resistivity tungsten PVD with enhanced ionization and RF power coupling Electricity 15 Active
US7722737B2 Gas distribution system for improved transient phase deposition Chemistry; Metallurgy 15 Active
US7964040B2 Multi-port pumping system for substrate processing chambers Emerging Cross-Sectional Technologies 12 Active
US8252410B2 Ceramic cover wafers of aluminum nitride or beryllium oxide Emerging Cross-Sectional Technologies 10 Active
US7141138B2 Gas delivery system for semiconductor processing Electricity 9 Expired
US7183227B1 Use of enhanced turbomolecular pump for gapfill deposition using high flows of low-mass fluent gas Electricity 7 Expired
US10407771B2 Atomic layer deposition chamber with thermal lid Electricity 7 Active
US8911601B2 Deposition ring and electrostatic chuck for physical vapor deposition chamber Electricity 6 Active
US7572647B2 Internal balanced coil for inductively coupled high density plasma processing chamber Electricity 5 Active
US10167553B2 Apparatus and method for providing a uniform flow of gas Chemistry; Metallurgy 5 Active
US10519546B2 Apparatus and method for providing a uniform flow of gas Chemistry; Metallurgy 5 Active
US8968537B2 PVD sputtering target with a protected backing plate Electricity 5 Active
US7789993B2 Internal balanced coil for inductively coupled high density plasma processing chamber Electricity 5 Active
USD936187S1 Gas distribution assembly lid General 5 Active
US9914999B2 Oxidized showerhead and process kit parts and methods of using same Chemistry; Metallurgy 5 Active
US9689070B2 Deposition ring and electrostatic chuck for physical vapor deposition chamber Electricity 5 Active
US9960021B2 Physical vapor deposition (PVD) target having low friction pads Electricity 5 Active
US9633824B2 Target for PVD sputtering system Emerging Cross-Sectional Technologies 5 Active
US9222172B2 Surface treated aluminum nitride baffle Chemistry; Metallurgy 4 Active
US9396933B2 PVD buffer layers for LED fabrication Electricity 4 Active
US9177763B2 Method and apparatus for measuring pressure in a physical vapor deposition chamber Electricity 4 Active
US9534286B2 PVD target for self-centering process shield Emerging Cross-Sectional Technologies 4 Active
US9087679B2 Uniformity tuning capable ESC grounding kit for RF PVD chamber Electricity 3 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.