Residual gain monitoring and reduction for EUV drive laser
US10524345B2 · kind B2 · utility
6Cited by
20References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 5, 2018 |
| Grant date | Dec 31, 2019 |
| Priority date | — |
| Expiry date | Apr 5, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2383
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A laser system includes a laser source operable to provide a laser beam; a laser amplifier having an input port and an output port and operable to amplify the laser beam, the laser beam travelling along a main beam path through the laser amplifier from the input port to the output port; and a residual gain monitor operable to provide a probe laser beam, the probe laser beam travelling along a probe beam path through the laser amplifier from the output port to the input port, wherein the residual gain monitor calculates a residual gain of the laser amplifier according to the probe laser beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.