Method for modifying surface of non-conductive substrate and sidewall of micro/nano hole with rGO
US10543510B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 2, 2017 |
| Grant date | Jan 28, 2020 |
| Priority date | — |
| Expiry date | Apr 28, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K3/042
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Non-conductive substrates, especially the sidewalls of micro/nano holes thereof are chemically modified (i.e., chemically grafted) by reduced graphene oxide (rGO). The rGO possesses excellent electrical conductivity and therefore the modified substrates become conductive, so that it can be directly electroplated. These rGO-grafted holes can pass thermal shock reliability test after electroplating. The rGO grafting process possesses many advantages, such as a short process time, no complex agent (i.e., no chelator), no toxic agents (i.e., formaldehyde for electroless Cu deposition). It is employed in an aqueous solution instead of an organic solvent, and therefore is environmentally friendly and beneficial for industrial production.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.