Ion assisted deposition top coat of rare-earth oxide
US10544500B2 · kind B2 · utility
2Cited by
61References
20Claims
0Family size
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Key dates
| Filing date | Sep 27, 2017 |
| Grant date | Jan 28, 2020 |
| Priority date | — |
| Expiry date | Sep 27, 2037 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24992
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A chamber component comprises a body, a first protective layer and a conformal second protective layer over the first protective layer. The first protective layer comprises a plasma resistant ceramic, has a thickness of greater than approximately 50 microns and comprises a plurality of cracks and pores. The conformal second protective layer comprises a plasma resistant rare earth oxide, has a thickness of less than 50 microns, has a porosity of less than 1%, and seals the plurality of cracks and pores of the first protective layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.