Focus control arrangement and method
US10551308B2 · kind B2 · utility
1Cited by
4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 14, 2016 |
| Grant date | Feb 4, 2020 |
| Priority date | — |
| Expiry date | Mar 14, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/4792
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An inspection apparatus includes an optical system, which has a radiation beam delivery system for delivering radiation to a target, and a radiation beam collection system for collecting radiation after scattering from the target. Both the delivery system and the collection system comprise optical components that control the characteristics of the radiation and the collected radiation. By controlling the characteristics of one or both of the radiation and collected radiation, the depth of focus of the optical system may be increased.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.