Armand Eugene Albert Koolen
31Patents
5h-index
57Co-inventors
72Inventor score
Filing activity: Nov 21, 2003 → Apr 30, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8411287B2 | Metrology method and apparatus, lithographic apparatus, device manufacturing method and substrate | Physics | 81 | Active |
| US6958806B2 | Lithographic apparatus and device manufacturing method | Physics | 74 | Expired |
| US7425397B2 | Method of determining an illumination profile and device manufacturing method | Physics | 12 | Active |
| US7026082B2 | Method for determining parameters for lithographic projection, a computer system and computer program therefor, a method of manufacturing a device and a device manufactured thereby | Physics | 11 | Expired |
| US10816909B2 | Metrology system and method for determining a characteristic of one or more structures on a substrate | Physics | 5 | Active |
| US9158194B2 | Metrology method and apparatus, and device manufacturing method | Physics | 5 | Active |
| US9811003B2 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Physics | 4 | Active |
| US10107761B2 | Method and device for focusing in an inspection system | Physics | 3 | Active |
| US10191391B2 | Metrology method and apparatus, computer program and lithographic system | Physics | 3 | Active |
| US9535338B2 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Physics | 3 | Active |
| US10599047B2 | Metrology apparatus, lithographic system, and method of measuring a structure | Physics | 2 | Active |
| US10317805B2 | Method for monitoring a characteristic of illumination from a metrology apparatus | Physics | 2 | Active |
| US10983445B2 | Method and apparatus for measuring a parameter of interest using image plane detection techniques | Physics | 1 | Active |
| US10678145B2 | Radiation receiving system | Physics | 1 | Active |
| US11415900B2 | Metrology system and method for determining a characteristic of one or more structures on a substrate | Physics | 1 | Active |
| US10598483B2 | Metrology method, apparatus and computer program | Physics | 1 | Active |
| US10852247B2 | Variable corrector of a wave front | Physics | 1 | Active |
| US10599048B2 | Metrology apparatus, method of measuring a structure, device manufacturing method | Physics | 1 | Active |
| US11150563B2 | Method of measuring a parameter of a patterning process, metrology apparatus, target | Physics | 1 | Active |
| US10551308B2 | Focus control arrangement and method | Physics | 1 | Active |
| US10866526B2 | Metrology method and device | Physics | 0 | Active |
| US10788757B2 | Metrology method and apparatus, computer program and lithographic system | Physics | 0 | Active |
| US10423077B2 | Metrology method and apparatus, computer program and lithographic system | Physics | 0 | Active |
| US12366811B2 | Metrology system and method for determining a characteristic of one or more structures on a substrate | Physics | 0 | Active |
| US10495889B2 | Beam homogenizer, illumination system and metrology system | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.