Pellicle composition for photomask, pellicle for photomask formed from the pellicle composition, method of forming the pellicle, reticle including the pellicle, and exposure apparatus for lithography including the reticle
US10551735B2 · kind B2 · utility
2Cited by
3References
29Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 5, 2018 |
| Grant date | Feb 4, 2020 |
| Priority date | — |
| Expiry date | Apr 5, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pellicle composition for a photomask, a pellicle for a photomask, the pellicle for a photomask being formed from the pellicle composition, a method of forming the pellicle, a reticle including the pellicle, and an exposure apparatus for lithography including the reticle are provided. The pellicle composition includes: at least one selected from graphene quantum dots and a graphene quantum dot precursor, the graphene quantum dots having a size of about 50 nm or less; and a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.