Method for the correction of electron proximity effects
US10553394B2 · kind B2 · utility
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14Claims
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Key dates
| Filing date | Aug 28, 2014 |
| Grant date | Feb 4, 2020 |
| Priority date | — |
| Expiry date | Aug 28, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2487
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for projecting an electron beam onto a target includes correction of the scattering effects of the electrons in the target. This correction is made possible by a calculation step of a point spread function having a radial variation according to a piecewise polynomial function.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.