Ion assisted deposition top coat of rare-earth oxide
US10563297B2 · kind B2 · utility
1Cited by
62References
9Claims
0Family size
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Key dates
| Filing date | Nov 28, 2017 |
| Grant date | Feb 18, 2020 |
| Priority date | — |
| Expiry date | Nov 28, 2037 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24992
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of manufacturing an article comprises providing an article. An ion assisted deposition (IAD) process is performed to deposit a second protective layer over a first protective layer. The second protective layer is a plasma resistant rare earth oxide having a thickness of less than 50 microns and a porosity of less than 1%. The second protective layer seals a plurality of cracks and pores of the first protective layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.