Patent · US Active

Gas separation control in spatial atomic layer deposition

US10570511B2 · kind B2 · utility

1Cited by

1References

13Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Ning Li · White Plains, US
Steven Marcus · Tempe, US
Tai T. Ngo · Dublin, US
Kevin Griffin · Livermore, US

Key dates

Filing date	Aug 31, 2015
Grant date	Feb 25, 2020
Priority date	—
Expiry date	Oct 3, 2037

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/45557
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Apparatus and methods for spatial atomic layer deposition including at least one first exhaust system and at least one second exhaust system. Each exhaust system including a throttle valve and a pressure gauge to control the pressure in the processing region associated with the individual exhaust system.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.