Gas concentration sensors and systems
US10571430B2 · kind B2 · utility
0Cited by
9References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 10, 2017 |
| Grant date | Feb 25, 2020 |
| Priority date | — |
| Expiry date | Jul 2, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2291/102
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A chemical vapor deposition or atomic layer deposition system includes a gas concentration sensor for determining the quantity of precursor gases admitted thereto. The gas concentration sensor can include a transmitter and a receiver for transmitting an acoustic signal across a chamber. In embodiments, the transmitter and receiver are designed to increase transmitted signal while reducing transmitted noise, facilitating use of the gas concentration sensor at low pressure and high temperature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.