Method of fabricating a color filter array using a multilevel structure
US10571804B2 · kind B2 · utility
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15Claims
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Key dates
| Filing date | Dec 19, 2016 |
| Grant date | Feb 25, 2020 |
| Priority date | — |
| Expiry date | Jun 5, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/1303
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of fabricating a color filter array including providing substrate, forming a multilevel structure that is attached to the substrate, etching the multilevel structure to expose first wells in the multilevel structure, filling at least the first wells in the multilevel structure with the first color component, curing the first color component, etching the multilevel structure to expose second wells in the multilevel structure, filling at least the second wells in the multilevel structure with a second color component, and curing the second color component.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.