Mask pattern generation based on fast marching method
US10578963B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Apr 23, 2018 |
| Grant date | Mar 3, 2020 |
| Priority date | — |
| Expiry date | May 8, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/76
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods, apparatuses, and systems for determining a binary mask pattern from a pixelated mask pattern include: determining, by a processor, based on a fast marching method (FMM), arrival values for pixels of a portion of the pixelated mask pattern; determining the binary mask pattern based on the arrival values; and updating at least one of the arrival values based on a comparison between a design pattern corresponding to the pixelated mask pattern and a substrate pattern simulated based on the binary mask pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.