Patent · US Active

Method and apparatus for inspection and metrology

US10578979B2 · kind B2 · utility

0Cited by

5References

19Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Sietse Thijmen Van Der Post · Utrecht, NL
Ferry Zijp · Nuenen, NL
Sander Bas Roobol · Veldhoven, NL

Key dates

Filing date	Feb 19, 2019
Grant date	Mar 3, 2020
Priority date	—
Expiry date	Feb 19, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7085
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.