Beam delivery apparatus and method
US10580545B2 · kind B2 · utility
3Cited by
23References
38Claims
0Family size
Assignee
Inventors
- Vadim Yevgenyevich Banine
- Petrus Rutgerus Bartraij
- Ramon Pascal Van Gorkom
- Lucas J. P. Ament
- Pieter Willem Herman De Jager
- Gosse Charles De Vries
- Rilpho Ludovicus Donker
- Wouter Joep ENGELEN
- Olav Waldemar Vladimir Frijns
- Leonardus Adrianus Gerardus Grimminck
- Andelko Katalenic
- Erik Roelof Loopstra
- Han-Kwang Nienhuys
- Andrey Nikipelov
- Michael Jozef Mathijs Renkens
- Franciscus Johannes Joseph Janssen
- Borgert Kruizinga
Key dates
| Filing date | Sep 24, 2014 |
| Grant date | Mar 3, 2020 |
| Priority date | — |
| Expiry date | Sep 24, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/065
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.