30 nm in-line LPC testing and cleaning of semiconductor processing equipment
US10583465B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 13, 2017 |
| Grant date | Mar 10, 2020 |
| Priority date | — |
| Expiry date | Nov 22, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2015/1486
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The implementations described herein generally relate to 30 nm in-line liquid particle count testing equipment which analyses and cleans semiconductor processing equipment. More specifically, the implementations described relate to a system for diluting, analyzing, and modifying fluids to enable the observation of the contents of the fluids. A dilution sampling tool is coupled with a liquid particle detector for reading the contents of an extraction solution containing particles from semiconductor processing equipment, such as a liner, a shield, a faceplate, or a showerhead, in a cleaning tank. As such, accurate liquid particle readings may be had which reduce oversaturation of the particle detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.