Alignment system
US10585363B2 · kind B2 · utility
3Cited by
6References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 14, 2016 |
| Grant date | Mar 10, 2020 |
| Priority date | — |
| Expiry date | Mar 14, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70141
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.