Facet mirror
US10599041B2 · kind B2 · utility
1Cited by
6References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 31, 2014 |
| Grant date | Mar 24, 2020 |
| Priority date | — |
| Expiry date | May 10, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70575
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Illumination optical unit for illuminating an object field in a projection exposure apparatus, comprising a first facet mirror with a structure, which has a spatial frequency of at least 0.2 mm−1 in at least one direction, and a second facet mirror, comprising a multiplicity of facets, wherein the facets are respectively provided with a mechanism for damping spatial frequencies of the structure of the first facet mirror.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.