Pellicle frame, pellicle containing same, method for producing pellicle frame, and method for producing pellicle
US10606169B2 · kind B2 · utility
0Cited by
1References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 15, 2016 |
| Grant date | Mar 31, 2020 |
| Priority date | — |
| Expiry date | Jan 26, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D11/22
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The purpose of the present invention is to provide: a pellicle frame which is not susceptible to deterioration even if irradiated with short-wavelength light such as excimer light, and which is not susceptible to generation of an outgas or foreign substance; and a pellicle which uses this pellicle frame. In order to achieve the above-described purpose, this pellicle frame for supporting the outer periphery of a pellicle film is configured to comprise a frame and a film that is formed on the surface of the frame and contains a polyimide resin.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.