Metrology method and apparatus
US10620550B2 · kind B2 · utility
0Cited by
0References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 30, 2018 |
| Grant date | Apr 14, 2020 |
| Priority date | — |
| Expiry date | Aug 30, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70641
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method comprising: evaluating a plurality of polarization characteristics associated with measurement of a metrology target of a substrate processed using a patterning process, against one or more measurement quality parameters; and selecting one or more polarization characteristics from the plurality of polarization characteristics based on one or more of the measurement quality parameters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.