Adjustable side gas plenum for edge rate control in a downstream reactor
US10622189B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 11, 2016 |
| Grant date | Apr 14, 2020 |
| Priority date | — |
| Expiry date | Sep 17, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/334
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A side tuning ring for a gas distribution device of a substrate processing system includes a first ring adjacent to a faceplate of the gas distribution device. The first ring surrounds the faceplate and defines a first plenum, communicates with a first gas source, and includes a first plurality of holes arranged to direct gas from the first gas source into a process chamber at a first angle. A second ring is adjacent to the first ring. The second ring surrounds the first ring and defines a second plenum, communicates with at least one of the first gas source and a second gas source, and includes a second plurality of holes arranged to direct gas from the at least one of the first gas source and the second gas source into the process chamber at the first angle or a second angle. The first ring and the second ring are detachable from the faceplate of the gas distribution device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.