Apparatus for prevention of backside deposition in a spatial ALD process chamber
US10658223B2 · kind B2 · utility
0Cited by
7References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 24, 2017 |
| Grant date | May 19, 2020 |
| Priority date | — |
| Expiry date | Nov 20, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68792
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Susceptor assemblies comprising a susceptor with a support post are described. The susceptor has a body with a top surface and a bottom surface. The top surface has a plurality of recesses therein. The support post is connected to the bottom surface of the susceptor to rotate the susceptor assembly. The support post includes support post vacuum plenum in fluid communication with a susceptor vacuum plenum in the body of the susceptor. The support post also includes a purge gas line extending through the support post to a purge gas plenum in the body of the susceptor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.