Gauge pattern selection
US10663870B2 · kind B2 · utility
1Cited by
15References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 30, 2016 |
| Grant date | May 26, 2020 |
| Priority date | — |
| Expiry date | Jan 22, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/705
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method including obtaining a plurality of gauges of a plurality of gauge patterns for a patterning process, each gauge pattern configured for measurement of a parameter of the patterning process when created as part of the patterning process, and creating a selection of one or more gauges from the plurality of gauges, wherein a gauge is included in the selection provided the gauge and all the other gauges, if any, of the same gauge pattern, or all of the one or more gauges of the same gauge pattern linked to the gauge, pass a gauge printability check.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.