Mirror arrangement for microlithographic projection exposure apparatus and related method
US10663873B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 29, 2016 |
| Grant date | May 26, 2020 |
| Priority date | — |
| Expiry date | May 5, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70825
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mirror arrangement, in particular for a microlithographic projection exposure apparatus, includes at least one mirror element bearing a mirror surface provided for reflecting electromagnetic radiation, at least one carrier element including a head section, which is provided for receiving at least one mirror element, and also a seat section. The arrangement further includes a mount arrangement, for receiving the at least one carrier element. At least one insertion opening is in the mount arrangement. The seat section of the carrier element plunges into the insertion opening. In addition, the arrangement includes a channel device for guiding a heat transfer medium is formed in the mount arrangement in the region surrounding the seat section. A method for dissipating heat is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.