Hermann Bieg
12Patents
3h-index
21Co-inventors
56Inventor score
Filing activity: Dec 18, 2003 → Mar 28, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8009343B2 | Optical imaging device having at least one system diaphragm | Physics | 4 | Active |
| US7684125B2 | Diaphragm changing device | Physics | 3 | Expired |
| US7929227B2 | Optical assembly | Physics | 3 | Active |
| US10606179B2 | Projection exposure apparatus for semiconductor lithography with reduce thermal deformation | Physics | 2 | Active |
| US7791826B2 | Optical assembly | Physics | 2 | Active |
| US7763870B2 | Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements | Physics | 1 | Active |
| US8089707B2 | Diaphragm changing device | Physics | 1 | Active |
| US8687169B2 | Optical aperture device | Physics | 1 | Active |
| US10663873B2 | Mirror arrangement for microlithographic projection exposure apparatus and related method | Physics | 0 | Active |
| US8570676B2 | Optical assembly | Physics | 0 | Active |
| US9341955B2 | Optical aperture device | Physics | 0 | Active |
| US10139733B2 | Diaphragm changing device | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.