Extreme ultraviolet light source
US10667377B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 28, 2015 |
| Grant date | May 26, 2020 |
| Priority date | — |
| Expiry date | Nov 12, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70058
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.