System, method and non-transitory computer readable medium for tuning sensitivies of, and determining a process window for, a modulated wafer
US10679909B2 · kind B2 · utility
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Key dates
| Filing date | Nov 14, 2017 |
| Grant date | Jun 9, 2020 |
| Priority date | — |
| Expiry date | Jul 19, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8883
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system, method, and non-transitory computer readable medium are provided for tuning sensitivities of, and determining a process window for, a modulated wafer. The sensitivities for dies of the modulated wafer are tuned dynamically based on a single set of parameters. Further, the process window is determined for the modulated wafer from prior determined parameter-specific nominal process windows.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.