Measuring concentrations of radicals in semiconductor processing
US10685819B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 9, 2018 |
| Grant date | Jun 16, 2020 |
| Priority date | — |
| Expiry date | Jun 15, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8411
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus includes a reactive species source, a spectral measurement volume, a light source to emit a light beam into the spectral measurement volume, a spectrometer to receive the light beam from the spectral measurement volume. The apparatus includes an a controller configured to, when a reactive species is present in the spectral measurement volume, control the light source to emit the light beam into the spectral measurement volume and the spectrometer to determine an environment spectrum using the light beam, and when the reactive species is not present in the spectral measurement volume, control the light source to emit the light beam into the spectral measurement volume and the spectrometer to determine a baseline spectrum using the light beam, calculate a net spectrum based on a difference between the environment spectrum and the baseline spectrum, and estimate a concentration of the reactive species based on the net spectrum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.