Patent · US Active

Physical vapor deposition processing systems target cooling

US10685821B2 · kind B2 · utility

3Cited by

3References

19Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Sanjay Bhat · Singapore, SG
Vibhu Jindal · Milpitas, US
Vishwas Kumar Pandey · Savanuru, IN

Key dates

Filing date	Aug 18, 2017
Grant date	Jun 16, 2020
Priority date	—
Expiry date	Feb 2, 2038

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB23K2103/12
WIPO fieldMachine tools
WIPO sectorMechanical engineering

Abstract

Physical vapor deposition target assemblies and methods of manufacturing such target assemblies are disclosed. An exemplary target assembly comprises a flow pattern including a plurality of arcs and bends fluidly connected to an inlet end and an outlet end.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.