Sanjay Bhat
35Patents
4h-index
46Co-inventors
59Inventor score
Filing activity: Feb 14, 2006 → May 18, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9497832B2 | Systems and methods for managing environmental conditions | Emerging Cross-Sectional Technologies | 44 | Active |
| US7794544B2 | Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system | Emerging Cross-Sectional Technologies | 36 | Active |
| US7536373B2 | Resource allocation using relational fuzzy modeling | Physics | 8 | Active |
| US11422096B2 | Surface topography measurement apparatus and method | Physics | 4 | Active |
| US10685821B2 | Physical vapor deposition processing systems target cooling | Performing Operations; Transporting | 3 | Active |
| US11387085B2 | Multicathode deposition system | Electricity | 1 | Active |
| US10826717B2 | System and methods for cloud-based monitoring and control of physical environments | Physics | 1 | Active |
| US10504705B2 | Physical vapor deposition chamber with static magnet assembly and methods of sputtering | Electricity | 1 | Active |
| US10763091B2 | Physical vapor deposition chamber particle reduction apparatus and methods | Electricity | 1 | Active |
| US11557473B2 | System and method to control PVD deposition uniformity | Electricity | 1 | Active |
| US11515132B2 | Physical vapor deposition processing systems target cooling | Performing Operations; Transporting | 0 | Active |
| US10602589B2 | Systems and methods for managing environmental conditions | Emerging Cross-Sectional Technologies | 0 | Active |
| US11390940B2 | System and method to control PVD deposition uniformity | Electricity | 0 | Active |
| US11480866B2 | Method and apparatus to anneal EUV mask blank | Physics | 0 | Active |
| US11221599B2 | Systems and methods for managing environmental conditions | Emerging Cross-Sectional Technologies | 0 | Active |
| US11639544B2 | Physical vapor deposition system and processes | Electricity | 0 | Active |
| US11365475B2 | Physical vapor deposition chamber cleaning processes | Electricity | 0 | Active |
| US11940724B2 | Reticle processing system | Physics | 0 | Active |
| US8516065B2 | Criterion-dependent email display agent | Electricity | 0 | Active |
| US11789358B2 | Extreme ultraviolet mask blank defect reduction | Physics | 0 | Active |
| US11237473B2 | Physical vapor deposition system and processes | Physics | 0 | Active |
| US11599016B2 | Physical vapor deposition system and processes | Physics | 0 | Active |
| US11542595B2 | Physical vapor deposition system and processes | Electricity | 0 | Active |
| US11236415B2 | Deposition system with shield mount | Electricity | 0 | Active |
| US11037769B2 | Physical vapor deposition processing systems target cooling | Performing Operations; Transporting | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.