Method and apparatus to determine a patterning process parameter
US10691031B2 · kind B2 · utility
1Cited by
0References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 29, 2018 |
| Grant date | Jun 23, 2020 |
| Priority date | — |
| Expiry date | Aug 29, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method, includes illuminating a structure of a metrology target with radiation having a linear polarization in a first direction, receiving radiation redirected from the structure to a polarizing element, wherein the polarizing element has a polarization splitting axis at an angle to the first direction, and measuring, using the sensor system, an optical characteristic of the redirected radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.